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Semiconductor & High-Purity Materials

Trace metals in wafers, process chemicals and ultrapure water.

LabMS 5000 ICP-MS/MS for trace metals in high-purity materials

The workflow

Semiconductor analysis is a contamination problem before it is an analytical problem. Every touch point — the acid, the vessel, the autosampler, the laboratory air — sets the floor of the detection limit.

The catalog addresses the whole chain: sub-boiling acid purification, single-chamber digestion, ICP-MS and ICP-MS/MS with collision-reaction cell technology and SEMI S2 safety certification, automated sample introduction for high-throughput fabs, and ultra-clean laboratory design.

What makes it difficult

  • Reaching ultra-trace detection limits in high-matrix process chemicals
  • Controlling contamination from reagents, vessels and the laboratory environment
  • Removing polyatomic interferences without losing sensitivity
  • Automating calibration and sample introduction in a production environment

Typical samples

Silicon wafers and photovoltaic siliconProcess chemicals and slurriesUltrapure waterPhotoresists and solventsHigh-purity metals and targets

Step by step

How the sample moves.

01

Purify reagents

Sub-boiling distillation produces the low-blank acids that trace analysis depends on.

Acid Purification →
02

Prepare

Single-chamber digestion and automated acid dispensing for wafers, slurries and chemicals.

Microwave Digestion →
03

Analyze

ICP-MS and ICP-MS/MS with collision-reaction cell technology and SEMI S2 certification.

ICP-MS →
04

Automate

TotaLab systems prepare calibration curves, dilute and introduce samples on-line.

TotaLab Automation →

Send us the regulation and the limit

We map it to a LabTech configuration and tell you where the catalog stops short of your specification.